INFICON IC6 Thin Film Deposition Controller - Manual (Page 331)

A - 7
PN
07
4-
50
5-
P1
F
IC6 Operating Manual
198 SrO 4.990 0.517 strontium oxide
199 Ta 16.600 0.262 tantalum
200 Ta
2
O
5
8.200 0.300 tantalum (V) oxide
201 TaB
2
11.150 *1.000 tantalum boride
202 TaC 13.900 *1.000 tantalum carbide
203 TaN 16.300 *1.000 tantalum nitride
204 Tb 8.270 0.660 terbium
205 Tc 11.500 *1.000 technetium
206 Te 6.250 0.900 tellurium
207 TeO
2
5.990 0.862 tellurium oxide
208 Th 11.694 0.484 thorium
209 ThF
4
6.320 *1.000 thorium (IV) fluoride
210 ThO
2
9.860 0.284 thorium dioxide
211 ThOF
2
9.100 *1.000 thorium oxyfluoride
212 Ti 4.500 0.628 titanium
213 Ti
2
0
3
4.600 *1.000 titanium sesquioxide
214 TiB
2
4.500 *1.000 titanium boride
215 TiC 4.930 *1.000 titanium carbide
216 TiN 5.430 *1.000 titanium nitride
217 TiO 4.900 *1.000 titanium oxide
218 TiO
2
4.260 0.400 titanium (IV) oxide
219 TI 11.850 1.550 thallium
220 TIBr 7.560 *1.000 thallium bromide
221 TICI 7.000 *1.000 thallium chloride
222 TII 7.090 *1.000 thallium iodide (B)
223 U 19.050 0.238 uranium
224 U
3
O
8
8.300 *1.000 tri uranium octoxide
225 U
4
O
9
10.969 0.348 uranium oxide
226 UO
2
10.970 0.286 uranium dioxide
227 V 5.960 0.530 vanadium
228 V
2
O
5
3.360 *1.000 vanadium pentoxide
229 VB
2
5.100 *1.000 vanadium boride
230 VC 5.770 *1.000 vanadium carbide
231 VN 6.130 *1.000 vanadium nitride
232 VO
2
4.340 *1.000 vanadium dioxide
233 W 19.300 0.163 tungsten
Table A-1 Material table (continued)
Code Formula Density Z-Ratio Material Name