Metrohm 797 VA Computrace User Manual

Page 179

6.2 Calibration techniques with CVS and CPVS

797 VA Computrace – Software

167

With CPVS:

Step potential [ read only ; step 1: 0.2 V ]

Displays the potential values, which are defined in
the window

edit stripping steps

Bsln

Parameters for baseline evaluation (details see

Baseline

, section 5.2). Click the

button to open

the

BASELINE

window for the selected substance.

Additive solution

Definition of addition solutions for standard addi-
tion.

No. [ 0...8 ; 0 ]

Number of addition solution used for manual or
automatic addition. For automatic additions, this
number is also the Dosing Device number. If a
mixed standard solution is used, the number of
this solution must be entered for each substance
present in the mixed solution.

Achtung: Dosino 1..3 refer to Dosinos connected
to the 797 VA Computrace. Dosino 4...7 refer to
Dosinos connected to the 846 Dosing Interface (to
MSB 1...4).

Conc. [ > 0 ; 0 ]

Value for concentration of addition solution.

Unit [ fL/L...mL/L ; mL/L ]

Unit for concentration of addition solution.

Volume (mL) [ > 0.01 mL / var ; 0 mL ]

Addition volume. For entering variable addition
volumes, click the button to open the

EDIT VA-

RIED ADDITION

window for the selected substan-

ce (details see

Variable addition

, section 5.2). In

this case,

var

is entered into the field instead of a

fixed value. This field only appears once for soluti-
ons with the same number (mixed standards) and
it is not displayed if

is entered as solution num-

ber.

Contamination potential [ -5...5 ; 1.125 V ]

With CVS: If it is activated, the current is readout
for the defined potential during the last sweep (in
anodic direction) of the bath determination.
With CPVS: One of the defined stripping steps
(Voltammetric tab with Calibration technique
"MLAT") can be selected. If it is activated, the cur-
rent is readout for the selected potential during
the last sweep (in anodic direction) of the bath de-
termination.
The Contamination potential correlates with the
concentration of organic degradation products in
the electroplating bath.