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INFICON STC-2000A Thin Film Deposition Controller Operating Manual User Manual

Page 281

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STC-2000A DEPOSITION CONTROLLER

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1. h) description: Configuration of FILM, PROCESS, and MAP parameters can be accomplished by
menu keys or by host port commands. Since these parameters will be specific to the deposition process at
hand, specific details cannot be supplied here but must be tailored to the goal of the end user. All
parameters have default values, which may not reflect values needed for a specific deposition.

These three categories of parameters are interrelated as the MAP parameter set/group is called out

by a FILM parameter and a process parameter calls out the FILM parameter set.

There are 42 FILM parameters and these describe elements such as material density, z-factor,

material thickness, time setpoints for various parameters, power (ramp, soak and max power levels),
deposit rate, control loop parameters, shutter control, crystal parameters (sample control, stability and life
bounds), graphical data plot parameters, MAP select, indexer pocket select, and various mode selects: rate
ramp, shutter delay, FILM fail, and etching modes. These are generally related to a specific film deposition.

There are 20 Source Sensor MAP parameters and these are related to power supply parameters,

tooling factors, crystal channel configuration and behavior, indexer synchronization, and individual crystal
channel configuration and behaviors. These can be related to a specific power supply. There can be up to
10 sets of MAP parameters, each identified by a number from 1 to 10.

There can be up to 9 processes (9 process lists [or recipes]). Each process recipe is given an

identification number from 1 to 9. Each process recipe can have up to 99 steps [or layers]. Each step calls
out 1 FILM to be active. Non-sequencing mode has 1 implicit process and 1 active FILM. The active FILM
calls out 1 set of MAP parameters.
purpose: To program the unit to suit the deposition process needed (material, thickness, etc.).
background/conceptual info: pages
detailed info: pages
see index keyword
programming summary:
All three parameter categories can be accessed from the MAIN menu. The
MAIN menu is invoked by pressing the fixed MENU key. The FILM parameters can be reviewed/edited by
pressing the REVIEW FILM key. The MAP parameters can be reviewed/edited by pressing the REVIEW
SS MAP key. The PROCESS parameters can be reviewed/edited by pressing the REVIEW PROCESSES
key. The active PROCESS can be set by pressing the NEXT PROCESS key. Different sets of FILMs,
MAPs, and PROCESSES can be accessed by using the GO2 key on each menu: GO2 FLM (go to FILM),
GO2 MAP (go to MAP), GO2 PRC (go to PROCESS).

1. i) description: The BEEPER provides audio indications during power up and when keys are pressed. A
user programmable parameter allows the beeper to be disabled as a keyboard annunciator. The power on
beeper sequence cannot be disabled. There are various tonalities used to indicate various functions (eg. the
difference between a correct key press and incorrect key press [within LCD key graphic and outside of
LCD key graphics]).
purpose: Set BEEPER function to suit user needs.
background/conceptual info: pages
detailed info: pages
see index keyword
programming summary:
Fixed MENU key

EXECUTIVE MENU key → COMM. SETUP key →

KEYBOARD BEEP (EDIT/CHANGE).

2. a) description: The Runtime Screen is the screen that appears after the power on sequence is complete.
Pressing the fixed STATUS key from any menu screen will return the Runtime screen. Pressing the fixed
STATUS key while the Runtime screen is displayed will invoke 3 other status screens, in sequence, before
returning to the Runtime screen. The 3 other screens invoked by the STATUS key are referred to by their
numerical appearance in the sequence of screens: Alternate Runtime (1

st

STATUS screen), indexer status

(2

nd

STATUS screen) and channel status screens (3

rd

STATUS screen). The runtime screen is the

navigational beginning point of discussions about menu programming in this section. All menu references
are relative to the Runtime screen.
purpose: To check the status of the instrument, some of its parameters and elements of the deposition
process through various status screens. In addition, there are also some live keys that are related to the
functions at hand.
background/conceptual info: pages
detailed info:
pages 54,55 See Section 3.0

SECTION 10.XX

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