INFICON STC-2000A Thin Film Deposition Controller Operating Manual - Manual (Page 209)

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STC-2000A DEPOSITION CONTROLLER
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This parameter sets the duration of the power ramp from the soak 1 power value or the
idle power value to the value set by the soak 2 power parameter.
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Parameter 14 P o w e r Soak 2 Time
access: SKT2 soak time at power level 2
Value Range 0:00 - 99:59
Units Min:Sec
This parameter sets the time that the source will remain at the soak 2 power level
following the completion of the ramp to this level.
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Parameter 15 Idle P o w e r
access: PWR3 power condition power level 3
Value Range 0.0 - 100.0
Units Percent
This parameter determines the final (idle) power setting at the completion of the entire
deposition profile. If this power level is zero a start command will begin a new power
profile at rise 1. An idle power setting other than zero will cause the power profile to
begin at rise 2 after a start.
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Parameter 16 Idle Ramp Time
access: RMP3 ramp time to power level 3
Value Range 0:00 - 99:59
Units Min:Sec
This parameter sets the duration of the power ramp from the power level at the time that
final thickness was reached until the power reaches the value set by the idle power
parameter.
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Parameter 17 Deposit Rate
access: RATE requested rate for deposition
Value Range 0.0 - 999.9
Units Å/s (10-8 cm/s)
This parameter determines the material deposition rate that the closed loop control system
will try to establish and maintain at the time that closed loop operation begins.
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Parameter 18 Rate Ramp Mode
access: RRMD rate ramp mode, on/off
Value Range 0,1
Units 0 is Off, 1 is On
This parameter is a disable/enable switch for the rate ramp function and associated film
parameters. When set to Off the programming cursor window will skip over the
associated parameters. When set to on all associated parameters are accessible and it will
be possible to alter the deposition control rate profile during closed loop control.
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Parameter 19 New Dep osite Rate
access: NRAT new rate to ramp to
Value Range 0.0 - 999.9
Units Å/s
This parameter sets the new deposition rate value that is to be reached at the end of the
rate ramp operation.
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SECTION 6.XX page 209 of 292