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A - 7 – INFICON XTC/3 Thin Film Deposition Controller Operating Manual User Manual

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A - 7

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XTC/3 Operating Manual

TaN

16.300

*1.000

tantalum nitride

Tb

8.270

0.660

terbium

Tc

11.500

*1.000

technetium

Te

6.250

0.900

tellurium

TeO

2

5.990

0.862

tellurium oxide

Th

11.694

0.484

thorium

ThF

4

6.320

*1.000

thorium (IV) fluoride

ThO

2

9.860

0.284

thorium dioxide

ThOF

2

9.100

*1.000

thorium oxyfluoride

Ti

4.500

0.628

titanium

Ti

2

0

3

4.600

*1.000

titanium sesquioxide

TiB

2

4.500

*1.000

titanium boride

TiC

4.930

*1.000

titanium carbide

TiN

5.430

*1.000

titanium nitride

TiO

4.900

*1.000

titanium oxide

TiO

2

4.260

0.400

titanium (IV) oxide

TI

11.850

1.550

thallium

TIBr

7.560

*1.000

thallium bromide

TICI

7.000

*1.000

thallium chloride

TII

7.090

*1.000

thallium iodide (B)

U

19.050

0.238

uranium

U

3

O

8

8.300

*1.000

tri uranium octoxide

U

4

O

9

10.969

0.348

uranium oxide

UO

2

10.970

0.286

uranium dioxide

V

5.960

0.530

vanadium

V

2

O

5

3.360

*1.000

vanadium pentoxide

VB

2

5.100

*1.000

vanadium boride

VC

5.770

*1.000

vanadium carbide

VN

6.130

*1.000

vanadium nitride

VO

2

4.340

*1.000

vanadium dioxide

W

19.300

0.163

tungsten

WB

2

10.770

*1.000

tungsten boride

WC

15.600

0.151

tungsten carbide

WO

3

7.160

*1.000

tungsten trioxide

WS

2

7.500

*1.000

tungsten disulfide

WSi

2

9.400

*1.000

tungsten silicide

Table A-1 Material table (continued)

Formula

Density

Z-Ratio

Material Name