INFICON XTC/3 Thin Film Deposition Controller Operating Manual - Manual (Page 212)

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XTC/3 Operating Manual
Ho 8.800 0.580 holmium
Ho
2
O
3
8.410 *1.000 holmium oxide
In 7.300 0.841 indium
In
2
O
3
7.180 *1.000 indium sesquioxide
In
2
Se
3
5.700 *1.000 indium selenide
In
2
Te
3
5.800 *1.000 indium telluride
InAs 5.700 *1.000 indium arsenide
InP 4.800 *1.000 indium phosphide
InSb 5.760 0.769 indium antimonide
Ir 22.400 0.129 iridium
K 0.860 10.189 potassium
KBr 2.750 1.893 potassium bromide
KCI 1.980 2.050 potassium chloride
KF 2.480 *1.000 potassium fluoride
KI 3.128 2.077 potassium iodide
La 6.170 0.920 lanthanum
La
2
O
3
6.510 *1.000 lanthanum oxide
LaB
6
2.610 *1.000 lanthanum boride
LaF
3
5.940 *1.000 lanthanum fluoride
Li 0.530 5.900 lithium
LiBr 3.470 1.230 lithium bromide
LiF 2.638 0.778 lithium fluoride
LiNbO
3
4.700 0.463 lithium niobate
Lu 9.840 *1.000 lutetium
Mg 1.740 1.610 magnesium
MgAl
2
O
4
3.600 *1.000 magnesium aluminate
MgAl
2
O
6
8.000 *1.000 spinel
MgF
2
3.180 0.637 magnesium fluoride
MgO 3.580 0.411 magnesium oxide
Mn 7.200 0.377 manganese
MnO 5.390 0.467 manganese oxide
MnS 3.990 0.940 manganese (II) sulfide
Mo 10.200 0.257 molybdenum
Mo
2
C 9.180 *1.000 molybdenum carbide
MoB
2
7.120 *1.000 molybdenum boride
MoO
3
4.700 *1.000 molybdenum trioxide
Table A-1 Material table (continued)
Formula Density Z-Ratio Material Name