INFICON IC/5 Thin Film Deposition Controller - Manual (Page 309)

Index - 1
IP
N 07
4-
23
7A
E
IC/5 Operating Manual
Index
A
abort 10-20
acoustic impedance 2-9
active oscillator 2-6 , 2-8
Activity 3-15
aerial mass density 2-10
aggregate
rate 4-13 , 5-5 , 10-1
thickness 4-14
anharmonic 2-2 , 2-7 , 2-9 , 3-36
unable to detect 3-37
AT
crystal 2-8
resonator 2-3
Auto Z 3-36 , 4-8 , 12-1
unable to 3-36 , 3-37
Auto-Control-Tune 2-12 , 2-15
automatic process control 10-25
AutoTune 12-11 , 12-15
C
cable noise 11-7
calibration 12-3
cross talk 12-4
co-deposition 3-26 , 5-6 , 12-6
comm port 3-17
communication
command set 7-10
commands 7-10
configuration
system 10-6
configure
sensor 3-22
source 3-22
control
loop 4-5
system 2-14
controller
gain 2-13
model 2-11 , 2-13
cross talk calibration 3-19 , 12-4
crossover pressure 10-17
crucible 3-34
crystal
fail 4-9
frequency spectrum 2-8
known, used 3-36
life 3-12
new 3-36
quality 4-8
replacement 13-23
resonance frequency 3-33
resonance point 2-8
switch 3-32
unknown, used 3-36
use history 3-42
Customer Service 1-6
Customer Support
Return Material Authorization 1-6
D
DAC 8-8 , 11-10
datalog 3-40
dead time 2-11
Declaration Of Contamination 1-6
density 4-5
calibration 12-1
value 12-1
deposition control
multiple sensor 10-1
single sensor 10-1
deviation 4-8
diffusion pump 10-16
directory number 4-1
DTE 11-13
DTR/DSR 7-5
E
earth ground 1-4 , 11-5
electrode-to-quartz bond 2-3
electromagnetic interference 11-10
electron beam gun 10-9 , 10-11 , 10-23
error 3-24
command 7-41
I/O 6-21
material setup 4-15
process set-up 5-8
remote communication 7-4
source/sensor 8-9
utility set-up 9-7
evaporation source. 2-11
event condition 6-6
F
fast source 2-11
feed ramp 4-12
film-induced stress 2-11
fit, weighted least-square-exponential 2-12