INFICON XTC/C Thin Film Deposition Controller - Manual (Page 184)

Index - 2
IP
N 07
4-
18
3X
XTC/C - XTC/2 Operating Manual
M
Manual Power 2-34
mass sensitivity 5-4
measured deposition rate 5-14
Measurement And Control Loop 4-4
measurement theory 5-4
mode hopping 5-10
ModeLock 5-11
monitor crystals 5-5
Monitoring - Systems with a Source Shutter
2-30
Monitoring - Systems Without a Source
Shutter
2-29
multi-layer controller 2-36
multiple layer deposition 5-4
N
noise pickup 3-3
O
one layer controller 2-33
operation 1-8
oscillator 1-9 , 5-11
oscillator circuit 5-10
P
parameter limits 4-6
parameter update errors 6-2
period measurement technique 5-7
PID 5-12 , 5-14 , 5-15
post deposit 2-15
power 5-14
pre deposit 2-15
process
error 5-14
process recipe storage 1-7
process, defining 2-36
programming 4-1
pulse accumulator 5-7
Q
Q-Factor 4-15
quality rate control 5-8
quartz crystal 5-4 , 5-5 , 5-16
quasiharmonic 5-5
quick use guide 2-1
R
rate deviation 2-13
rate ramp 2-15 , 4-19
rate sampling 2-31
rate set point 5-14
RateWatcher 2-12 , 4-21
rear panel 2-18
recorder 2-28
recorder output 1-7
reference oscillator 5-7
relays 3-15
Remote command 3-32
repair support 1-11
resonance 5-9
return material authorization 1-12
S
series resonance 5-11
slow source 4-12
soak power level 4-20
soft crystal failures 4-14
source 2-14
source 1,2 2-27
source control 1-6 , 2-35
source outputs 3-20
source shutter 3-15
specifications 1-6
sputtering sensor 3-6
standard sensor 3-6
state descriptions 4-6
Status command 3-28
stops 4-9
T
test mode 2-12 , 3-11
thickness shear mode 5-5
thickness twist mode 5-5
time power state 2-35
time-power 4-22
tooling 5-1 , 5-2
tuning 4-11
U
unpacking 2-1
Update Command 3-28
Update command 3-28
V
voltage selection 2-4
W
windup 5-15
X
XIU (Crystal Interface Unit) 1-9