Ocean Optics NanoCalc - Manual (Page 76)

Ocean Optics Germany GmbH Thin Film Metrology
75
Example I:
Measure SiO
2
on a Si-Wafer
Go to menu Edit layer structure.
Settings:
L1 (layer1)
oxides SiO
2
_(therm)
bulk (substrate) semiconductors Si
ref (reference) semiconductors
Si
user limits 0 nm - 1050 nm
estimated thickness 50 nm
Go to menu Screen > Frequency limits and adjust the plot limits and the extraction range to:
System max. plot limits [nm] max. extraction range [nm]
VIS
400 – 850 450 – 800
XR
250 – 1050 300 – 1000
DUV
190 – 1100 220 – 1050
NIR
900 – 1700 950 – 1650
For thin materials choose a bigger range, for thicker materials (NIR) choose a smaller range and set the
smoothing factor 1.