INFICON STM-2XM 2-Channel Rate/Thickness Monitor - Manual (Page 49)

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STM-2XM Operating Manual
Tooling, X1:SRC2 . . . . . . . . . . . . . . The ratio between substrate thickness using
Source 2 and Sensor 1 thickness (see
section 7.3, Determining Tooling, on page
7-2
).
NOTE: In independent chambers. Set this
value to zero.
Tooling, X2:SRC2 . . . . . . . . . . . . . . The ratio between substrate thickness using
Source 2 and Sensor 2 thickness (see
section 7.3, Determining Tooling, on page
7-2
).
Weight Ratio . . . . . . . . . . . . . . . . . . Available only in spatial averaging mode.
This parameter describes the percentage of
time the substrate is near Sensor 1. In
moving substrate systems, if the substrate
spends more time near one sensor than the
other, this needs to be accounted for in the
computations. If the substrate spends 90% of
time near Sensor 1, this parameter should be
programmed for 90%. If the substrate is
fixed, the default value is 50%.
Substrate Shutr . . . . . . . . . . . . . . . Configures the substrate shutter delay
operation (see Table 3-3 ).
Anal. Scl Mode . . . . . . . . . . . . . . . . Thickness, Mass
Table 3-3 Substrate shutter setup parameters
Substrate shutter
setup
Shutter Delay
Thick hold
None N
CH1: Substrate3 Only for film on Channel 1
CH2: Substrate Only for film on Channel 2
Shared substrate Only allows shutter delay for one film at a time
Dual substrate Allows dual shutter delay (alloy shutter delay)