INFICON SQC-310 Thin Film Deposition Controller - Manual (Page 84)

Appendix
Formula Density Z-Ratio Material Name
Fe 7.860 0.349 Iron
Fe
2
O
3
5.240 *1.000 Iron Oxide
FeO 5.700 *1.000 Iron Oxide
FeS 4.840 *1.000 Iron Sulphide
Ga 5.930 0.593 Gallium
Ga
2
O
3
5.880 *1.000 Gallium Oxide (B)
GaAs 5.310 1.590 Gallium Arsenide
GaN 6.100 *1.000 Gallium Nitride
GaP 4.100 *1.000 Gallium Phosphide
GaSb 5.600 *1.000 Gallium Antimonide
Gd 7.890 0.670 Gadolinium
Gd
2
O
3
7.410 *1.000 Gadolinium Oxide
Ge 5.350 0.516 Germanium
Ge
3
N
2
5.200 *1.000 Germanium Nitride
GeO
2
6.240 *1.000 Germanium Oxide
GeTe 6.200 *1.000 Germanium Telluride
Hf 13.090 0.360 Hafnium
HfB
2
10.500 *1.000 Hafnium Boride,
HfC 12.200 *1.000 Hafnium Carbide
HfN 13.800 *1.000 Hafnium Nitride
HfO
2
9.680 *1.000 Hafnium Oxide
HfSi
2
7.200 *1.000 Hafnium Silicide
Hg 13.460 0.740 Mercury
Ho 8.800 0.580 Holminum
Ho
2
O
3
8.410 *1.000 Holminum Oxide
In 7.300 0.841 Indium
In
2
O
3
7.180 *1.000 Indium Sesquioxide
In
2
Se
3
5.700 *1.000 Indium Selenide
In
2
Te
3
5.800 *1.000 Indium Telluride
InAs 5.700 *1.000 Indium Arsenide
InP 4.800 *1.000 Indium Phosphide
InSb 5.760 0.769 Indium Antimonide
Ir 22.400 0.129 Iridium
K 0.860 10.189 Potassium
KBr 2.750 1.893 Potassium Bromide
KCl 1.980 2.050 Potassium Chloride
KF 2.480 *1.000 Potassium Fluoride
KI 3.128 2.077 Potassium Iodide