INFICON MDC-370 Thin Film Deposition Controller - Manual (Page 130)

MDC-370 DEPOSITION CONTROLLER
Manganese Mn 7.20 23.42
Manganese (II) Sulfide MnS 3.99 9.39
Mercury Hg 13.46 11.93
Molybdenum Mo 10.20 34.36
Nickel Ni 8.91 26.68
Niobium Nb 8.57 17.91
Palladium Pd 12.00 24.73
Platinum Pt 21.40 36.04
Potassium Chloride KC 1.98 4.31
Rhenium Re 21.04 58.87
Rhodium Rh 12.41 42.05
Samarium Sm 7.54 9.92
Scandium Sc 3.0 9.70
Selenium Se 4.82 10.22
Silicon Si 2.32 12.40
Silicon (II) Oxide SiO 2.13 10.15
Silicon Dioxide (fused quartz) SiO
2
2.2 8.25
Silver Ag 10.50 16.69
Silver Bromide AgBr 6.47 7.48
Silver Chloride AgCl 5.56 6.69
Sodium Na 0.97 1.84
Sodium Chloride NaCl 2.17 5.62
Strontium Sr 2.620 ----
Sulphur S 2.07 3.86
Tantalum Ta 16.60 33.70
Tantalum (IV) Oxide Ta
2
O
5
8.2 29.43
Tellurium Te 6.25 9.81
Terbium Tb 8.27 13.38
Thallium Tl 11.85 5.70
Tin Sn 7.30 12.20
Titanium Ti 4.50 14.06
Titanium (IV) Oxide TiO
2
4.26 22.07
Tungsten W 19.30 54.17
Tungsten Carbide WC 15.60 58.48
Uranium U 18.70 37.10
Vanadium V 5.96 16.66
Ytterbium Yb 6.98 7.81
Yttrium Y 4.34 10.57
Zinc Zn 7.04 17.18
Zinc Oxide ZnO 5.61 15.88
Zinc Selenide ZnS 5.26 12.23
Zinc Sulfide ZnS 4.09 11.39
Zirconium Zr 6.51 14.72
THEORY OF OPERATION 10-8