Ivoclar Vivadent Telio Lab - Manual (Page 15)

Individualizing the incisal area using the cut-back technique
– After polymerization is completed and the restoration has been removed from the silicone key, the
incisal area of the Telio Lab restoration is reduced by means of cross-cut burs.
– Check the reduction (cut-back) with the silicone key.
– Blast the surface with aluminium oxide at 2 bar / 29 psi pressure or roughen.
– Apply Telio Lab Cold Liquid (monomer) on the clean surface (reaction time min. 2 to max. 4 minutes).
– After that, condition the surface with SR Composiv in order to ensure a sound bond between the
restoration and Telio Stains. The layer thickness of SR Composiv must be between 0.2 and 0.5 mm;
the processing time is 3 minutes.
– The material is cured in a light-polymerization device (e.g. Spectramat).
– The incisal area is now individualized using Telio Stains.
Polymerization in a water bath
(e.g. Ivomat ® IP3)
Even pouring Application on the isolation model Placing the silicone key
Pressure (bar/psi) Temperature (°C/°F) Time (min)
2–6/29–87 40–50/104–122 15
Fabricating temporaries in the casting technique
– Fill the silicone key with ready-mixed and well-flowable Telio Lab Dentin without causing any air bubbles.
– Apply Telio Lab Dentin on the isolated model without air bubbles.
– Place the silicone key on the model in the correct position.
– Once Telio Lab has reached its plastic phase, the material is polymerized under pressure in a water
bath for 15 minutes at 2-6 bar / 29-87 psi and a temperature of 40-50 °C / 104-122 °F.
Telio
Lab
–
Fabricating
temporaries
in
the
casting
technique
15