Care and maintenance, Cleaning – Hoefer SE640 User Manual
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Care and maintenance
Cleaning
Immediately after each use, rinse the upper and
lower buffer chambers with water and then
rinse thoroughly with distilled water. Handle
the upper buffer chamber with care to prevent
damage to the banana plugs and lower electrode
fin. Clean gaskets with mild detergent and rinse
with distilled water. Allow to air dry.
Clean glass plates and spacers with a dilute solu-
tion of a laboratory cleanser such as RBS-35,
™
then rinse thoroughly with tap and distilled
water. Glass plates can also be treated with (but
not stored in) acid cleaning solutions.
• Do not autoclave or heat any part above 45 °C.
• Do not use organic solvents, abrasives, strong
cleaning solutions, or strong acids or bases to clean
the chambers.
• Do not soak the laminated gasket.
Caution! Always unplug unit
from electrical supply before
cleaning or drying the unit.