Chemical resistance of centrivap components, Chapter 3: getting started – Labconco CentriVa DNA Systems 7970037 User Manual
Page 12
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Chapter 3: Getting Started
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8
Chemical Resistance of CentriVap
Components
Your CentriVap DNA Centrifugal Concentrator is designed to be chemical
resistant to most compounds that are commonly used in the concentration
processes that are performed in it. However, by necessity, the CentriVap is
comprised of a number of different materials, some of which may be attacked and
degraded by certain chemicals. The degree of degradation is obviously dependent
on the concentration and duration of exposure. Some major components of the
CentriVap that are susceptible to degradation are as follows:
Acids Bases Solvents
COMPONENT MATERIAL Acetic Acid 20%
Boric Acid
Formic Acid
Hydrobromic A
cid 20%
Hydroc
hlor
ic Acid 20
%
Nitric Acid 2
0%
Sulfuric Acid 1
0%
Trifluoro
acetic Acid
(TFA)
Ammoni
um Hydroxi
de
Acetone
Acetonitri
le
Chlor
oform
Dimethyl F
orm
amid
e
Dimethyl S
ulfo
xide (DMSO)
Ethano
l
Ethyl Acetate
Hexa
nes
Isoprop
on
al
Methan
ol
Methylene Chloride
Methyl t-Butyl Ether (MTBE)
T
olue
ne
Wa
te
r
Rotor
Hub
Polypropylene C
D
C
Lid
Chamber Acrylic
C D
C D D
D D C D D C D
D
Chamber Epoxy
coated
Aluminum
C D
C D
Tubing PVC
D C D
D
D D
D D C D D D
D
Lid Gasket
EPDM
D
D
C
D
Rotor Anodized
Aluminum
D D
Rotor
Shaft Stainless
Steel D D
D
Bearings High
Carbon
Steel
D
D D D D D D
D D
C-Moderate Degradation-Questionable use
D-Severe Degradation-Infrequent use recommended-immediate thorough
cleaning required.
• Diaphragm vacuum pumps sold by Labconco have wetted parts either made
from PTFE or protected by PTFE coatings and are suitable for nearly all
procedures.