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Chemical resistance of centrivap components, Chapter 3: getting started – Labconco CentriVa DNA Systems 7970037 User Manual

Page 12

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Chapter 3: Getting Started

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8

Chemical Resistance of CentriVap
Components

Your CentriVap DNA Centrifugal Concentrator is designed to be chemical
resistant to most compounds that are commonly used in the concentration
processes that are performed in it. However, by necessity, the CentriVap is
comprised of a number of different materials, some of which may be attacked and
degraded by certain chemicals. The degree of degradation is obviously dependent
on the concentration and duration of exposure. Some major components of the
CentriVap that are susceptible to degradation are as follows:

Acids Bases Solvents

COMPONENT MATERIAL Acetic Acid 20%

Boric Acid

Formic Acid

Hydrobromic A

cid 20%

Hydroc

hlor

ic Acid 20

%

Nitric Acid 2

0%

Sulfuric Acid 1

0%

Trifluoro

acetic Acid

(TFA)

Ammoni

um Hydroxi

de

Acetone

Acetonitri

le

Chlor

oform

Dimethyl F

orm

amid

e

Dimethyl S

ulfo

xide (DMSO)

Ethano

l

Ethyl Acetate

Hexa

nes

Isoprop

on

al

Methan

ol

Methylene Chloride

Methyl t-Butyl Ether (MTBE)

T

olue

ne

Wa

te

r

Rotor

Hub

Polypropylene C

D

C

Lid

Chamber Acrylic

C D

C D D

D D C D D C D

D

Chamber Epoxy

coated

Aluminum

C D

C D


Tubing PVC

D C D

D

D D

D D C D D D

D

Lid Gasket

EPDM

D

D

C

D

Rotor Anodized

Aluminum

D D

Rotor

Shaft Stainless

Steel D D

D

Bearings High

Carbon

Steel

D

D D D D D D

D D


C-Moderate Degradation-Questionable use
D-Severe Degradation-Infrequent use recommended-immediate thorough

cleaning required.

• Diaphragm vacuum pumps sold by Labconco have wetted parts either made

from PTFE or protected by PTFE coatings and are suitable for nearly all
procedures.