Hoefer SE250 - Manual (Page 22)

4. Care and Maintenance
• Do not autoclave or heat any part above 45 °C.
• Do not use organic solvents, abrasives, strong
cleaning solutions, or strong acids or bases to
clean the chambers.
• Immediately after each use, rinse the unit with
water and then rinse thoroughly with distilled
water. Handle the upper buffer chamber core
with care to prevent damage to the banana
plugs. Allow to air dry.
• Clean glass and alumina plates and spacers
with a dilute solution of a laboratory cleanser
such as RBS-35
™ , then rinse thoroughly with
tap and distilled water. Glass plates can also be
treated with (but not stored in) acid cleaning
solutions.
•
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